nanofab@diaotuotech.com
+86-19820819249
It is imprinted with independently developed nanoimprint adhesive.It features acid and alkali resistance, no fluorescence, chemical modifiability, and polishing resistance.It can be used to manufacture sequencing chips for second-generation gene sequencers.Compared with photolithography products, the nano-well array flow cell produced by nanoimprint technology has lower cost. The array arrangement of nano-wells ensures the uniform distribution of sequencing clusters, enabling more effective utilization of the flow cell surface area. It has significant advantages over non-array types, which is conducive to increasing data output, reducing sequencing costs, and shortening operation time.
Features:
The imprint resist has high hardness and can withstand polishing processes.
It can resist acid-base cleaning processes in subsequent sequencing procedures.
After simple treatment on its surface, the imprint resist can undergo subsequent chemical modification.
Product Specifications:
Appearance: Colored glass sheet.
Size: 8 inches, can be cut into small pieces as needed.
Microstructure size: Can be adjusted according to the actual requirements of the sequencer.
Precautions:
Avoid scratching the surface with sharp objects.
If there is oil or dust on the resist layer surface after skin contact, it can be cleaned and removed with solvents such as ethanol.
Contact: Mike
Phone: +86-19820819249
Tel: +86-19820819249
Email: nanofab@diaotuotech.com
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