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Automatic Nanoimprinter

It features functions such as automatic wafer loading, roll pressing, exposure, and demolding. The operation interface is concise, and parameters including roll pressing speed, roll pressing pressure, exposure time, and demolding method can be adjusted to achieve optimal transfer effects.

Product mainMain Functions:

1.Imprinting Mode: UV nanoimprint lithography (NIL), with heating support;

2. The equipment adopts a flexible film as the template substrate. The template is stretched flat by a tension mechanism, and the tension is adjustable;

3. The exposure light source is a 365nm UV LED light source, which has high light intensity and uniform light intensity distribution;

4. High imprinting uniformity and high aspect ratio;

5. The equipment is equipped with 1 set of high-efficiency FFU (Fan Filter Unit) filter, and the internal cleanliness reaches Class 100 or above;

6. The equipment is configured with control software. It can store no less than 50 sets of process parameters; it can realize automatic sample feeding, roll pressing, exposure and demolding, and all process parameters are adjustable.


Product main technical parameters:

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