Square Spin Coater

It uses the centrifugal force generated by high-speed rotation to uniformly coat the glue solution on the surface of the substrate, forming a uniform thin film. This equipment has excellent performance and is suitable for processing wafers of various sizes. Meanwhile, it has both spin-coating and brush-coating functions, which can meet the daily scientific research needs of universities and research institutes in fields such as semiconductor preparation, nanoimprint lithography, and optoelectronic materials.